Title |
Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD / Josef Stein |
|---|---|
Involved |
Josef Stein (Verfasser) |
Published |
Aachen: Shaker |
Extent |
Online-Ressource : 77 Abb. |
ISBN |
978-3-8265-6218-1 |
Language |
|
Country |
|
Topic |
|
Subject |
|
Series |
Berichte aus der Halbleitertechnik |
Persistent identifier |
|
Further information |
Lizenzpflichtig |
Record ID |
1106839145 |
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