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Stefan E. Schulz (1964-)

Name	Stefan E. Schulz
Time	1964- (Date of birth and death)
Place	Deutschland
Gender	männlich
Academic degree	Prof. Dr.
Related	Fraunhofer-Einrichtung für Elektronische Nanosysteme Fraunhofer-Institut für Elektronische Nanosysteme
Further information	Diss. Fachbereich Elektrotechnik und Informationstechnik
Record type	Person
GND-Identifier	11548258X
Record ID	11548258X
Involved in show all Binary and ternary metal alloys as diffusion barriers in advanced copper interconnects. Laserinduzierte Kristallisation dünner Co-Fe-B-Schichten Charged domains in ferroelectric, polycrystalline yttrium manganite thin films resolved with scanning electron microscopy Disturbing-free determination of yeast concentration in DI water and in glucose using impedance biochips Advanced Characterization Methods for Electrical and Sensoric Components and Devices at the Micro and Nano Scales Sensoric Micro and Nano Systems P-N junction-based Si biochips with ring electrodes for novel biosensing applications Magnesium β-Ketoiminates as CVD Precursors for MgO Formation Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition Untersuchung des selektiven Wolfram-CVD-Prozesses zur Viafüllung

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Stefan E. Schulz (1964-)

Binary and ternary metal alloys as diffusion barriers in advanced copper interconnects.

Laserinduzierte Kristallisation dünner Co-Fe-B-Schichten

Charged domains in ferroelectric, polycrystalline yttrium manganite thin films resolved with scanning electron microscopy

Disturbing-free determination of yeast concentration in DI water and in glucose using impedance biochips

Advanced Characterization Methods for Electrical and Sensoric Components and Devices at the Micro and Nano Scales

Sensoric Micro and Nano Systems

P-N junction-based Si biochips with ring electrodes for novel biosensing applications

Magnesium β-Ketoiminates as CVD Precursors for MgO Formation

Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition

Untersuchung des selektiven Wolfram-CVD-Prozesses zur Viafüllung