Title |
A study of imprint and etching behavior on fused silica of a new tailored resist mr-NIL213FC for soft UV-NIL / Shuhao Si, Christoph Weigel, Martin Messerschmidt, Manuel W. Thesen, Stefan Sinzinger, Steffen Strehle |
|---|---|
Involved |
Shuhao Si (Verfasser)
Christoph Weigel (Verfasser) Martin Messerschmidt (Verfasser) Manuel W. Thesen (Verfasser) |
Published |
Ilmenau: TU Ilmenau |
Extent |
Online-Ressource |
Language |
|
Country |
|
Topic |
|
Subject |
Soft UV NIL |
DDC notation |
|
Persistent identifier |
urn:nbn:de:101:1-2020060813323854689119 (URN) |
Further information |
In: Micro and nano engineering(6, 2020) |
Record ID |
1211603946 |
Please note
The beta version does not yet contain all functions and information of the DNB portal catalogue. If you are missing information or want to order a medium, please visit the page in the DNB portal catalogue via the following link: