Title |
Highly Anisotropic Fluorine‐Based Plasma Etching of Ultralow Expansion Glass |
|---|---|
Involved |
Christoph Weigel (Verfasser)
Hai Binh Phi (Verfasser) Felix Arthur Denissel (Verfasser) Martin Hoffmann (Verfasser) |
Published in |
|
Published |
11.03.2021 |
Language |
|
Country |
|
Subject |
fluorine plasma |
Persistent identifier |
urn:nbn:de:101:1-2021031214030190120916 (URN) |
Record ID |
122924591X |
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