Title |
Plasma‐Induced Nanocrystalline Domain Engineering and Surface Passivation in Mesoporous Chalcogenide Semiconductor Thin Films |
|---|---|
Involved |
Aditya Ashok (Verfasser)
Arya Vasanth (Verfasser) Tomota Nagaura (Verfasser) Miharu Eguchi (Verfasser)
Nunzio Motta (Verfasser)
Hoang‐Phuong Phan (Verfasser) Nam‐Trung Nguyen (Verfasser) Joseph G. Shapter (Verfasser) Jongbeom Na (Verfasser) Yusuke Yamauchi (Verfasser) |
Published in |
Angewandte Chemie : a journal of the Gesellschaft Deutscher Chemiker. International edition 11.02.2022 |
Published |
11.02.2022 |
Language |
|
Country |
|
Subject |
Domain Enhancement |
Persistent identifier |
urn:nbn:de:101:1-2022021114273514922505 (URN) |
Record ID |
1251593615 |
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