Title |
Highly anisotropic fluorine-based plasma etching of ultralow expansion glass / Christoph Weigel, Hai Binh Phi, Felix Arthur Denissel, Martin Hoffmann, Stefan Sinzinger, Steffen Strehle |
|---|---|
Involved |
Christoph Weigel (Verfasser)
Hai Binh Phi (Verfasser) Felix Arthur Denissel (Verfasser) Martin Hoffmann (Verfasser) |
Published |
Ilmenau: TU Ilmenau |
Extent |
Online-Ressource |
Language |
|
Country |
|
Topic |
|
Subject |
fluorine plasma |
DDC notation |
|
Persistent identifier |
urn:nbn:de:101:1-2022032803064140508754 (URN) |
Further information |
In: Advanced engineering materials(23), H. 6 |
Record ID |
1254164987 |
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