Title |
Facile Resist‐Free Nanopatterning of Monolayers of MoS 2 by Focused Ion‐Beam Milling |
|---|---|
Involved |
Rajeshkumar Mupparapu (Verfasser)
Michael Steinert (Verfasser) Antony George (Verfasser) Zian Tang (Verfasser) |
Published in |
Advanced materials interfaces 7, 19, 2020 |
Published |
23.08.2020 |
Language |
|
Country |
|
Subject |
focused ion beam |
Persistent identifier |
urn:nbn:de:101:1-2022052811595582601437 (URN) |
Record ID |
1258630923 |
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