Title |
Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO₂ / Everett D. Grimley, Tony Schenk, Thomas Mikolajick, Uwe Schroeder, James M. LeBeau |
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Involved |
Everett D. Grimley (Verfasser) |
Published |
Dresden: Technische Universität Dresden |
Extent |
Online-Ressource |
Language |
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Country |
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Topic |
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Subject |
dünne Schichten
Speicher Transistoren Hochwinkel-Dunkelfeld (HAADF) Raster-Transmissions-Elektronenmikroskopie (STEM)
HAADF-STEM
Domänenwände ferroelektrisches HfO2 Interphasengrenzen thin films memories transistors high-angle annular dark-field (HAADF) Scanning Transmission Electron Microscopy (STEM) HAADF-STEM domain walls ferroelectric HfO2 interphase boundaries |
DDC notation |
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Persistent identifier |
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Further information |
In: Advanced Electronic Materials, Erscheinungsjahr: 2018, Jahrgang: 5, Heft: 5, Seiten: 1701258-1-1701258-9, E-ISSN: 2199-160X |
Record ID |
1266716645 |
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