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Jun Fang, Leslie Schlag, Se‐Chul Park et al.

Approaching Gas Phase Electrodeposition: Process and Optimization to Enable the Self‐Aligned Growth of 3D Nanobridge‐Based Interconnects

Published in: Advanced materials 28, 9, 2016

Title

Approaching Gas Phase Electrodeposition: Process and Optimization to Enable the Self‐Aligned Growth of 3D Nanobridge‐Based Interconnects

Involved 
Jun Fang (Verfasser)
Leslie Schlag (Verfasser)
Se‐Chul Park (Verfasser)
Thomas Stauden (Verfasser)
Jörg Pezoldt (Verfasser)
Peter Schaaf (Verfasser)
Heiko O. Jacobs (Verfasser)

Published in

Advanced materials 28, 9, 2016, Seite 1770-1779

Published

21.12.2015

Language

Englisch

Country

Deutschland

Subject

electrodeposition
nanobridge‐based interconnects
self‐aligned nanowires
self‐assembly

Persistent identifier

urn:nbn:de:101:1-2022110306125272869245 (URN)
10.1002/adma.201503039 (DOI)

Record ID

1271878925
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