Title |
Distinct Contact Scaling Effects in MoS 2 Transistors Revealed with Asymmetrical Contact Measurements |
|---|---|
Involved |
Zhihui Cheng (Verfasser)
Jonathan Backman (Verfasser) Huairuo Zhang (Verfasser) Hattan Abuzaid (Verfasser)
Guoqing Li (Verfasser)
Yifei Yu (Verfasser) Linyou Cao (Verfasser) Albert V. Davydov (Verfasser) Mathieu Luisier (Verfasser) Curt A. Richter (Verfasser) Aaron D. Franklin (Verfasser) |
Published in |
Advanced materials 05.04.2023 |
Published |
05.04.2023 |
Language |
|
Country |
|
Subject |
contact scaling |
Persistent identifier |
urn:nbn:de:101:1-2023040615095728474228 (URN) |
Record ID |
1285644816 |
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