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Joost Duvigneau, Stijn Cornelissen, Núria Bardají Valls et al.

Reactive Imprint Lithography: Combined Topographical Patterning and Chemical Surface Functionalization of Polystyrene‐ block ‐poly (tert ‐butyl acrylate) Films

Published in: Advanced functional materials 20, 3, 2010

Title

Reactive Imprint Lithography: Combined Topographical Patterning and Chemical Surface Functionalization of Polystyrene‐ block ‐poly (tert ‐butyl acrylate) Films

Involved 

Joost Duvigneau (Verfasser)
Stijn Cornelissen (Verfasser)
Núria Bardají Valls (Verfasser)
Holger Schönherr (Verfasser)
Gyula Julius Vancso (Verfasser)

Published in

Advanced functional materials 20, 3, 2010, Seite 460-468

Published

28.12.2009

Language

Englisch

Country

Deutschland

Subject

patterning
polymer films
reactive imprint lithography
surface functionalization
thermal activation

Persistent identifier

urn:nbn:de:101:1-2023060106295013367866 (URN)
10.1002/adfm.200901736 (DOI)

Record ID

1291131892
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