Title |
A Practical, Self‐Catalytic, Atomic Layer Deposition of Silicon Dioxide † |
|---|---|
Involved |
Julien Bachmann (Verfasser)
Robert Zierold (Verfasser) Yuen Tung Chong (Verfasser) Roland Hauert (Verfasser)
Chris Sturm (Verfasser)
Rüdiger Schmidt-Grund (Verfasser) Bernd Rheinländer (Verfasser) Marius Grundmann (Verfasser) Ulrich Gösele (Verfasser) Kornelius Nielsch (Verfasser) |
Published in |
Angewandte Chemie : a journal of the Gesellschaft Deutscher Chemiker. International edition 47, 33, 2008, Seite 6177-6179 |
Published |
11.07.2008 |
Language |
|
Country |
|
Subject |
atomic layer deposition |
Persistent identifier |
urn:nbn:de:101:1-2023061606505075390313 (URN) |
Record ID |
1292880236 |
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