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Konrad Jaekel

Wissenschaftlicher Mitarbeiter

Name	Konrad Jaekel
Place	Ilmenau (Wirkungsort) Deutschland
Gender	männlich
Profession	Wissenschaftlicher Mitarbeiter (characteristic profession)
Related	Technische Universität Ilmenau. Institut für Mikro- und Nanoelektronik
Record type	Person
GND-Identifier	1299762093
Record ID	1299762093
Involved in show all Influence of Additional Intermediate Thick Al Layers on the Reaction Propagation and Heat Flow of Al/Ni Reactive Multilayers Controlling Propagation Velocity in Al/Ni Reactive Multilayer Systems by Periodic 2D Surface Structuring Morphologies of Reactive Nanolayer Stacks Sputtered on Ceramic Low‐Temperature Cofired Ceramic Substrates Having a Micrometer‐Scale Surface Roughness Nanocalorimetry of Nanoscaled Ni/Al Multilayer Films: On the Methodology to Determine Reaction Kinetics for Highly Reactive Films Influence of Increasing Density of Microstructures on the Self‐Propagating Reaction of Al/Ni Reactive Nanoscale Multilayers Impact of Sample Preparation Approach on Transmission Electron Microscopy Investigation of Sputtered AlNi Multilayers Used for Reactive Soldering Tailoring the Reaction Path: External Crack Initiation in Reactive Al/Ni Multilayers Ni/Al multilayer reactions on nanostructured silicon substrates Influence of extrinsic induced tensile stress on the self-propagating high-temperature synthesis of nanosized Al/Ni multilayers Microstructural Characterization and Self‐Propagation Properties of Reactive Al/Ni Multilayers Deposited onto Wavelike Surface Morphologies: Influence on the Propagation Front Velocity Influence of extrinsic induced tensile stress on the self-propagating high-temperature synthesis of nanosized Al/Ni multilayers Microstructural characterization and self-propagation properties of reactive Al/Ni multilayers deposited onto wavelike surface morphologies: influence on the propagation front velocity Ni/Al multilayer reactions on nanostructured silicon substrates Phase transformation and characterization of 3D reactive microstructures in nanoscale Al/Ni multilayers Phase Transformation and Characterization of 3D Reactive Microstructures in Nanoscale Al/Ni Multilayers

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Konrad Jaekel

Influence of Additional Intermediate Thick Al Layers on the Reaction Propagation and Heat Flow of Al/Ni Reactive Multilayers

Controlling Propagation Velocity in Al/Ni Reactive Multilayer Systems by Periodic 2D Surface Structuring

Morphologies of Reactive Nanolayer Stacks Sputtered on Ceramic Low‐Temperature Cofired Ceramic Substrates Having a Micrometer‐Scale Surface Roughness

Nanocalorimetry of Nanoscaled Ni/Al Multilayer Films: On the Methodology to Determine Reaction Kinetics for Highly Reactive Films

Influence of Increasing Density of Microstructures on the Self‐Propagating Reaction of Al/Ni Reactive Nanoscale Multilayers

Impact of Sample Preparation Approach on Transmission Electron Microscopy Investigation of Sputtered AlNi Multilayers Used for Reactive Soldering

Tailoring the Reaction Path: External Crack Initiation in Reactive Al/Ni Multilayers

Ni/Al multilayer reactions on nanostructured silicon substrates

Influence of extrinsic induced tensile stress on the self-propagating high-temperature synthesis of nanosized Al/Ni multilayers

Microstructural Characterization and Self‐Propagation Properties of Reactive Al/Ni Multilayers Deposited onto Wavelike Surface Morphologies: Influence on the Propagation Front Velocity

Influence of extrinsic induced tensile stress on the self-propagating high-temperature synthesis of nanosized Al/Ni multilayers

Microstructural characterization and self-propagation properties of reactive Al/Ni multilayers deposited onto wavelike surface morphologies: influence on the propagation front velocity

Ni/Al multilayer reactions on nanostructured silicon substrates

Phase transformation and characterization of 3D reactive microstructures in nanoscale Al/Ni multilayers

Phase Transformation and Characterization of 3D Reactive Microstructures in Nanoscale Al/Ni Multilayers