Detail page

Knowledge Web

Person

Thomas Kups (1976-)

Physiker

Name	Thomas Kups
Time	1976- (Date of birth and death)
Place	Zerbst/Anhalt (Geburtsort) Jena (Wirkungsort) Ilmenau (Wirkungsort) Deutschland
Gender	männlich
Academic degree	Dr. rer. nat.
Profession	Physiker (characteristic profession)
Related	Technische Universität Ilmenau. Fachgebiet Werkstoffe der Elektrotechnik Friedrich-Schiller-Universität Jena. Physikalisch-Astronomische Fakultät
Source	AM Metadaten
Record type	Person
GND-Identifier	132045311
Record ID	132045311
Involved in show all Hydrogenated TiO 2 Nanoparticles Loaded with Au Nanoclusters Demonstrating Largely Enhanced Performance for Electrochemical Reduction of Nitrogen to Ammonia Hydrogenated TiO2 nanoparticles loaded with Au nanoclusters demonstrating largely enhanced performance for electrochemical reduction of nitrogen to ammonia Hydrogen-nitrogen plasma assisted synthesis of titanium dioxide with enhanced performance as anode for sodium ion batteries Only the combination of different NDT methods of material characterization is the key to success Solid-state dewetting of single- and bilayer Au-W thin films: unraveling the role of individual layer thickness, stacking sequence and oxidation on morphology evolution Grundlegende Betrachtungen zur Umsetzung der EU-Richtlinie 2013/59 : "Schutz vor den Gefahren einer Exposition gegenüber ionisierender Strahlung" aus der Sicht der Ausbildung und Industrie Diffusion in thin bilayer films during rapid thermal annealing Thin Film Synthesis of Ti 3 SiC 2 by Rapid Thermal Processing of Magnetron‐Sputtered Ti C Si Multilayer Systems † Schichten über Schichten : Innovative Beschichtungen für komplexe Anwendungen Black luminescent silicon Pyrolyzed photoresist film electrodes for application in electroanalysis Structural evolution of sputtered indium oxide thin films Transmissionselektronenmikroskopische Untersuchungen zur Gitterplatzbesetzung von Dotanden in Siliziumkarbid Transmissionselektronenmikroskopische Untersuchungen zur Gitterplatzbesetzung von Dotanden in Siliziumkarbid

Please note

The beta version does not yet contain all functions and information of the DNB portal catalogue. If you are missing information or want to order a medium, please visit the page in the DNB portal catalogue via the following link:

Katalog der Deutschen Nationalbibliothek

Thomas Kups (1976-)

Hydrogenated TiO 2 Nanoparticles Loaded with Au Nanoclusters Demonstrating Largely Enhanced Performance for Electrochemical Reduction of Nitrogen to Ammonia

Hydrogenated TiO2 nanoparticles loaded with Au nanoclusters demonstrating largely enhanced performance for electrochemical reduction of nitrogen to ammonia

Hydrogen-nitrogen plasma assisted synthesis of titanium dioxide with enhanced performance as anode for sodium ion batteries

Only the combination of different NDT methods of material characterization is the key to success

Solid-state dewetting of single- and bilayer Au-W thin films: unraveling the role of individual layer thickness, stacking sequence and oxidation on morphology evolution

Grundlegende Betrachtungen zur Umsetzung der EU-Richtlinie 2013/59 : "Schutz vor den Gefahren einer Exposition gegenüber ionisierender Strahlung" aus der Sicht der Ausbildung und Industrie

Diffusion in thin bilayer films during rapid thermal annealing

Thin Film Synthesis of Ti 3 SiC 2 by Rapid Thermal Processing of Magnetron‐Sputtered Ti C Si Multilayer Systems †

Schichten über Schichten : Innovative Beschichtungen für komplexe Anwendungen

Black luminescent silicon

Pyrolyzed photoresist film electrodes for application in electroanalysis

Structural evolution of sputtered indium oxide thin films

Transmissionselektronenmikroskopische Untersuchungen zur Gitterplatzbesetzung von Dotanden in Siliziumkarbid

Transmissionselektronenmikroskopische Untersuchungen zur Gitterplatzbesetzung von Dotanden in Siliziumkarbid