Title |
Influence of co-reactants on surface passivation by nanoscale hafnium oxide layers grown by atomic layer deposition on silicon |
---|---|
Involved |
Sophie L. Pain (Verfasser)
Edris Khorani (Verfasser) Anup Yadav (Verfasser) Tim Niewelt (Verfasser)
Antonio Leimenstoll (Verfasser)
Brendan F. M. Healy (Verfasser) Marc Walker (Verfasser) David Johannes Walker (Verfasser) Nicholas Ewen Grant (Verfasser) John D. Murphy (Verfasser) Albert-Ludwigs-Universität Freiburg. Institut für Nachhaltige Technische Systeme (Mitwirkender) Albert-Ludwigs-Universität Freiburg. Professur für Photovoltaische Energiekonversion (Mitwirkender) Fraunhofer-Institut für Solare Energiesysteme (Mitwirkender) |
Published |
Freiburg: Universität |
Extent |
Online-Ressource |
Language |
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Country |
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Topic |
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DDC notation |
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Persistent identifier |
urn:nbn:de:bsz:25-freidok-2459915 (URN) |
Further information |
RSC applied interfaces. - 1, 3 (2024) , 471-482, ISSN: 2755-3701 |
Record ID |
1330047338 |
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