Title |
Impact of Non‐Stoichiometric Phases and Grain Boundaries on the Nanoscale Forming and Switching of HfOₓ Thin Films / Niclas Schmidt, Nico Kaiser, Tobias Vogel, Eszter Piros, Silvia Karthäuser, Rainer Waser, Lambert Alff, Regina Dittmann |
|---|---|
Involved |
Niclas Schmidt (Verfasser)
Nico Kaiser (Verfasser) Tobias Vogel (Verfasser) Eszter Piros (Verfasser)
Silvia Karthäuser (Verfasser)
Rainer Waser (Verfasser) Lambert Alff (Verfasser) Regina Dittmann (Verfasser) |
Published |
Darmstadt: Universitäts- und Landesbibliothek |
Extent |
Online-Ressource |
Language |
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Country |
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Topic |
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Subject |
c‐AFM
defect engineering grain boundaries hafnium oxide
MBE
resistive switching |
DDC notation |
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Persistent identifier |
urn:nbn:de:tuda-tuprints-271198 (URN) |
Further information |
In: Advanced Electronic Materials, 10, (4), Wiley-VCH |
Record ID |
1332820905 |
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