Title |
Contact Resistance Optimization in MoS2 Field-Effect Transistors through Reverse Sputtering-Induced Structural Modifications / Yuan Fa, Agata Piacentini, Bart Macco, Holger Kalisch, Michael Heuken, Andrei Vescan, Zhenxing Wang, Max C. Lemme |
|---|---|
Involved |
Yuan Fa (Verfasser)
Agata Piacentini (Verfasser) Bart Macco (Verfasser) Holger Kalisch (Verfasser)
Michael Heuken (Verfasser)
Andrei Vescan (Verfasser) Zhenxing Wang (Verfasser) Max Christian Lemme (Verfasser) |
Published |
Aachen: Universitätsbibliothek der RWTH Aachen |
Extent |
Online-Ressource |
Language |
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Country |
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Topic |
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DDC notation |
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Persistent identifier |
urn:nbn:de:101:1-2504250137026.244781221669 (URN) |
Further information |
In: 10.1021/acsami.4c21596 |
Record ID |
136396903X |
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