Title |
Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si2H6 and SiH4 for low temperature silicon epitaxy / Chunlin Wang |
|---|---|
Involved |
Chunlin Wang (Verfasser) |
Published |
1993 |
Extent |
138 S. : Ill., graph. Darst. |
Thesis |
München, Techn. Univ., Diss., 1993 |
Topic |
|
Subject |
Plasmaätzen, Silicium, Einkristall |
Record ID |
940887088 |
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