Title |
Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD / Josef Stein |
|---|---|
Involved |
Josef Stein (Verfasser) |
Published |
Aachen: Shaker |
Edition |
Als Ms. gedr. |
Extent |
125 S. : Ill., graph. Darst. |
Thesis |
Zugl.: Aachen, Techn. Hochsch., Diss., 1999 |
ISBN |
978-3-8265-6218-1 |
Topic |
|
Subject |
|
Series |
Berichte aus der Halbleitertechnik |
Record ID |
956575188 |
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