Title |
STM- und XPS-Untersuchungen zum Reaktionsverhalten von TEOS auf Silicium / von Jürgen Spitzmüller |
|---|---|
Involved |
Jürgen Spitzmüller (Verfasser) |
Published |
2000 |
Extent |
1 CD-R + Beil. ([2] S.) |
Thesis |
Ulm, Univ., Diss., 2000 |
Topic |
|
Subject |
Silicium, Kristallfläche, Organosiloxane, Ethoxygruppe, Rastertunnelmikroskopie, Röntgen-Photoelektronenspektroskopie |
Further information |
Titel auf der Beil. - Dateiformate: doc, pdf, prn |
Record ID |
962016225 |
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