Title |
Investigations of perspective materials for aggressively scaled gate stacks and contact structures of MOS devices / vorgelegt von Andriy Goryachko |
|---|---|
Involved |
Andriy Goryachko (Verfasser) |
Published |
2002 |
Extent |
119 S. : Ill., graph. Darst. |
Thesis |
Cottbus, Techn. Univ., Diss., 2002 (Nicht für den Austausch) |
Language |
|
Topic |
|
Subject |
Silicium, Kristallfläche, Praseodymoxide, MOS |
Other editions |
Erscheint auch als Online-Ausgabe: Investigations of perspective materials for aggressively scaled gate stacks and contact structures of MOS devices |
Record ID |
968699855 |
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