Title |
Untersuchung speziell hergestellter Photolacke für die Erzeugung von Strukturen kleiner 100 nm mittels Elektronenstrahl-, IPL- und EUV-Lithographie / vorgelegt von Oliver Kirch |
|---|---|
Involved |
Oliver Kirch (Verfasser) |
Published |
2004 |
Extent |
[5], 129 S. : Ill., graph. Darst. |
Thesis |
Erlangen, Nürnberg, Univ., Diss., 2004 |
Topic |
|
Subject |
Photoresist, Elektronenstrahllithografie |
Record ID |
971440611 |
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