Title |
Investigation of physical and chemical interactions during etching of silicon in dual frequency capacitively coupled HBr/NF3 gas discharges / Marco Reinicke |
|---|---|
Involved |
Marco Reinicke (Verfasser) |
Published |
Norderstedt: Books on Demand |
Extent |
Online-Ressource |
Thesis |
Zugl.: Diss., TU Dresden |
ISBN |
978-3-8391-3844-1 |
Country |
|
Topic |
|
Subject |
|
DDC notation |
|
Persistent identifier |
|
Further information |
Lizenzpflichtig. - Vom Verlag als Druckwerk on demand angeboten |
Record ID |
999560743 |
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